ULTRAPURE WATER, UPW, HIGH PURITY WATER, MEMBRANES, ION EXCHANGE Microelectronics Conference


Conference on Electronics Water November 11-12, 2008 Hilton Hotel, Mesa (Phoenix), Arizona ULTRAPURE WATER--Micro is a two-day conference on Microelectronics Pure Water offering an Executive Forum consisting of state-of-the-art technical papers, Training Workshops, and Table-Top exhibits. Typical attendance is 200 individuals, mostly from the microelectronics industries. Details of the 2008 conference are available as a PDF file: *Micro2008.* Download a one-page registration form: MicroReg2008.pdf
HOTEL LOCATION--All ULTRAPURE WATER--Micro activities are held at the Hilton Hotel-Mesa (Phoenix), Arizona. For your convenience, we recommend that you stay at this hotel for the duration of the conference. The Hilton is located at 1011 West Holmes Avenue Mesa, Arizona, USA, 85210. Phone: 1-480-833-5555, just 3.00 miles from city center.	ROOM RATES-- Single or Double-$149(All rates subject to additional city taxes.) When making hotel reservations, it is important that you mention the ULTRAPURE WATER Conference. These special rates, as well as a block of rooms, are guaranteed only through October 21, 2008. Don’t miss out — phone in your reservations today at 480-833-5555, or 800-HILTONS. Refer to Tall Oaks Publishing, or Ultrapure Water in order to obtain this special rate. Or, visit: www.hiltonphoenixeast.com and use UWJ as the conference code.
*Executive Forum*
Tuesday, November 11 Moderator: Mr. Jeff Chapman, IBM 9:00 AM—Case Study: Damage to RO Membranes by the Overuse of Ion Exchange Resin Cleaning Chemicals in Pretreatment Softeners Timothy J. Miller, Purdue University – Birck Nanotechnology Center 9:30 AM—Behavior of Metal Deposition from High Purity Water during Wafer Rinsing Process Drew Sinha, Ph.D., Sumco 10:00 AM— Arsenic Removal from Electronics Manufacturing Wastewater James J. Pardini P.E., C.P.E., Magnesium Elektron Inc. 10:45 AM—A Device for Measuring of sub-50-nm Particles in High-Purity Water David Blackford, Fluid Measurement Technologies Inc.; Don Grant, CT Associates Inc. 11:15 AM— Measurement of sub-50-nm Particle Retention by High-Purity Water Filters Don Grant, CT Associates Inc.; Uwe Beuscher, W.L. Gore and Associates Inc. 1:15 PM— Development of State-of-the-Art 10-nm Filtration Membranes for High-Purity Water Barry Gotlinsky, Ph.D., and Vivien Krygier, Ph.D., Pall Corp. 1:15 PM—Meeting the ITRS Guidelines for High-Purity Water Particle Monitoring Bill Shade, Lighthouse Worldwide Solutions 2:15 PM—Overview of ITRS Developments Jeff Chapman, IBM 2:45-4:45 PM—ITRS Discussion Session 5:00-6:30 PM--Reception	Wednesday, November 12 Moderator: Andreas Neuber, Ph.D. Applied Materials 9:00 AM—Detection of Nano-Particles in High-Purity Water Andreas Neuber, Ph.D., Applied Material 9:30 AM—Controlled DI Water Gasification System for Advanced Semiconductor Cleaning Processes Annie Xia, Karl Niermeyer, Russ Mollica, Gregg Conner, Entegris Inc. 10:00 AM—New Technology for Counting Particles in High-Purity Water at 40-nm and Smaller John Mitchell and Dwight Sehler, Particle Measuring Systems 10:45 AM—Point of Use Water Recycling in Green Microelectronics Manufacturing Azita Yazdani, P.E., Exergy Technologies Corp. 11:15 AM—Transient Boron Leakage in a High-Purity Water System Lindsey Stahl and Jeff Chapman, IBM 1:00 PM—High-Flow Filter for High-Purity Water Applications: A Field Case Study Gary Van Schooneveld, CT Associates Inc.; Peter Nadolny, W.L. Gore and Associates, Inc. 1:30 PM—Electrochemical Methods for Water Reclaim in Semiconductor Manufacturing James C. Baygents and James Farrell, University of Arizona 2:00 PM—UV-Induced Polytetrafluoroethylene Degradation as a Source of Particulate Contamination in Ultrapure Water Systems Michael Green, Tim Strodtbeck, Photronics Inc. 2:30 PM—Particle Counting in High Purity Water Applications in the Microelectronics Industry Bill Shade, Lighthouse Worldwide Solutions
TRAINING WORKSHOPS offer training on various aspects of high-purity water for water treatment operators from the MICROELECTRONICS and other industries using High-Purity Water. Tuesday Morning 8:00 PM-12:00 1: Reverse Osmosis Fundamentals 2: Biological Control in High-Purity Water Systems Tuesday Afternoon 1:00 -5:00 3: Cleaning RO Systems 4: Designing Pretreatment for High-Purity RO/DI/EDI Systems Wednesday Morning 8:00-12:00 5: RO Monitoring and Troubleshooting 6: pH/Conductivity–Beyond the Fundamentals Wednesday Afternoon 1:00-5:00 7: Newer Technologies for High Purity Water 8: Designing New RO/DI/EDI and Rinsewater Recycle Systems
TABLETOP EXHIBITS--Exhibit hours: Tuesday: 1:00PM-7:00PM; Wednesday: 11:00AM–3:00PM. Click here for an Exhibitor's prospectus. 2008 Exhibitors: ASAHI AMERICA INC. l BALAZS ANALYTICAL l FLUID MEASUREMENT TECHNOLOGIES l HARVEL PLASTICS INC. l HEATEFLEX l LIGHTHOUSE WOLDWIDE SOLUTIONS l METTLER-TOLEDO THORNTON INC.l PROFESSIONAL WATER TECHNOLOGIES l RESINTECH l SIEMENS WATER TECHNOLOGIES l ULTRAVIOLET SCIENCES
Cancellations/refunds Refunds cannot be granted on cancellations received after November 8, 2008. Cancellations prior to this date are allowed without penalty. There will be a $30 processing fee on all refunds. If you need to change your plans to attend, you may transfer your registration to another person at any time without incurring any penalty.
For Further Information Contact: TALL OAKS PUBLISHING INC. Phone: 303-973-6700 (U.S.A.) Fax: 303-973-5327 Return to Home Page ULTRAPURE WATER® is a registered trademark of Tall Oaks Publishing Inc.