ULTRAPURE WATER Asia-2011 Proceedings

  • Model: UP1102
  • Shipping Weight: 0.3lbs
  • Manufactured by: Tall Oaks Publishing Inc.


This conference proceedings CD contains the PowerPoint presentations, and Papers when available. Titles of the presentations are listed below. The files are in Adobe Acrobat format for easy viewing.

July 6-7, 2011 Suntec Singapore
Co-located at the SIWW

Future Trends and Needs in High-Purity Water Treatment
Alan Knapp, Siemens Industry Inc., Water Technologies
Asian Water Business Opportunities in UPW in Microelectronics/Photovoltaic
Mehbub Khan, Veolia Water Solutions & Technologies
PUB’s Vision for Water Development in Singapore
Harry Seah, Director, Technology and Water Quality Office, Singapore PUB
Asian Water Business Trends
Chris Sacksteder, Strategic Marketing Manager, Industrial Water/Power/UPW, Dow Water & Process Solutions
Global Water Markets Overview
Evaporation Treatment Application for a Global Healthcare Manufacturer
Dionisio Visintin, Veolia Water Solutions & Technologies Italia s.r.l.
UV Oxidation with Persulfate for High-Purity Water in Microelectronics and Pharmaceutical Applications
Richard Woodling, J. Feng, J. Tan, A. Tan, Siemens Pte. Ltd.
Power Plant Steam: Water Cycle Makeup Treatment Raw Water Analysis
Mike Caravaggio, Integrated Solutions Pte. Ltd.
Preventing the Release of Nano Materials from Depleting Ion Exchange Beds by Using an Online Boron Analyzer
Rick Godec, GE Instruments
Urea in Town Waters and High-Purity Water
Michael Abert, Ph.D.; Andreas Balz; Stefan A. Huber, Ph.D., DOC-Labor Dr. Huber
New RO Elements Support Producing High-Purity Water with Less Energy
Yasushi Maeda and Jun Tonomura, Dow Chemical
Water Conservation Strategy for Non-Domestic Sector
Ong Guo Rong, Singapore PUB
Case Studies on Employing UF Technology to Reclaim Water from Semiconductor Wastewater in Taiwan
Ronald Wen-Jung Chang, Peter Chin-Yu Wang, Dow Chemical
Lowering the Operating Costs of Ion Exchange Equipment Using Degassing Membrane Contactors
Fred Wiesler, Membrana; Peter Shen, Shanghai Memtech Co. Ltd.; and J.S. Pan, Siemens-Ionpure Products
Medium Pressure UV Efficiency Decomposes Water-Borne Chlorine Compounds
Uri Levy, Ph.D., Atlantium
Sodium and Silica Trace Measurement To Meet Today’s Water Quality Specification in the Semiconductor Industry
Morris Teo, SWAN Analytical
Comparison of Boron Rejection Capabilities of RO Membranes
Gareth Thomas, Back on Track
Monitoring and Controlling UPW Organic Nitrogen Contamination to Improve Immersion Photolithography Process Control
Rick Godec, GE Instruments
Modular Design Approach for UPW Supply Utilizing High-Efficiency RO
Bill McClain, Michael Holland, and Paul Tan, GE Power and Water, Water & Process Technologies
Micro Media Column Filtration System for High Purity Water Production
Davis Arifin, Karthikeyan Sathrugnan, and Richard Woodling, Siemens Water Technologies
Membrane Technology of UF and RO for High-Purity Water Used in Semiconductor and LCD Manufacturing
Toshi Hamada, Nitto Denko; Presented by: Satoru Ishihara, Nitto Denko

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