ULTRAPURE WATER Micro-2009 Proceedings

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This conference proceedings CD contains the PowerPoint presentations, and Papers when available. Titles of the presentations are listed below. The files are in Adobe Acrobat format for easy viewing.

ULTRAPURE WATER® Micro 2009
Red Lion Hotel Jantzen Beach
Portland, Oregon, November 4-5, 2009

Wednesday, November 4

Session co-moderators: Slava Libman, Ph.D., M+W Zander U.S. Operations; Andreas Neuber, Ph.D., Applied Materials; and Rich Riley, Intel
9:15 AM—A Novel Photochemical Process for Water Purification
Mark Owen, Tom Hawkins, Ph.D., and Dave Moser, Puralytics
9:45 AM— Electropositive Ion Exchange Cartridge Filter Media for Use in the Production of Ultrapure Water
Rodney Komlenic and Christine Stanfel, Ahlstrom Filtration, LLC
10:45 AM— Reverse Osmosis: Maximizing Membrane Performance
Jane Kucera, Nalco Co.
11:15 AM—Ozone Sanitization as a Cost-Effective Alternative to Heat Sanitization
Hossein Zarrin and Hans Sundstrom, MKS Instruments
11:45 AM—Model Makeover for Reverse Osmosis Chemistry Modeling Software
Robert J. Ferguson and Baron R. Ferguson, French Creek Software
1:45 PM— Reducing the Total Costs of RO Operation - The Art of Membrane Cleaning
Jantje Johnson, Genesys North America
2:15 PM—Wastewater Treatment and Reclamation from Silicon Processing Operations in the PV and Semiconductor Industries
Vivien Krygier, Ph.D., and Rolf Berndt, Ph.D., Pall Corp.
2:45 PM— High Purity Water Needs for the PV Industry – Part 1: Development of Cost Effective Specification
John Morgan, H2Morgan; Slava Libman, Ph.D., M+W Zander U.S. Operations; Sarah Schoen, Ph.D., Balazs NanoAnalysis; Andreas Neuber, Ph.D., Applied Materials; and Marty Burkhart, Hi Pure Tech Inc.
3:30 PM— High Purity Water Needs for the PV Industry – Part 2: PV Manufacturing Overview
Andreas Neuber, Ph.D., Applied Materials; Slava Libman, Ph.D., M+W Zander U.S. Operations; Sarah Schoen, Ph.D., Balazs NanoAnalysis; Marty Burkhart, Hi Pure Tech Inc.; and John Morgan, H2Morgan
4:00 PM— Photovoltaic Facility Design - Approaches to Water and Wastewater Treatment
Dana Brumley, P.E., and Ralph Williams, P.E., CH2M Hill
4:30 PM—2009 International Technology Roadmap for Semiconductors (ITRS) Ultrapure Water Update
Jeff Chapman, IBM MATERIAL UNAVAILABLE
6:30 PM—ITRS Discussion

Thursday, November 5
9:00 AM— Treatment of Silicon Grinder Water for Water Reuse
Ray Groves, Ph.D., Enviroguard Inc.; Hans-Jurgen Voss, Caverion NA Inc.; and Michael Ong and Bob McIntosh, SolarWorld
9:30 AM— Quality Assurance of Process Measurements
Markus Bernasconi , SWAN Analytische Instrumente AG (Switzerland)
10:30 AM— Statistical Process Control for Continuous Processes
Gregory Carr, consultant
11:00 AM— Phosphorous Contamination from Ultrapure Water in Wet Cleaning of Silicon Wafer
Drew Sinha, Ph.D., SUMCO USA; and Jeff Chapman, IBM; and Richard Godec, GE Instruments
11:30 AM— Advanced Oxidation for the Removal of Organic Contaminants in Industrial Waters
Alan Knapp, Dr. Richard Woodling, Ph.D.; and Feng Jing, Ph.D. Siemens Water Technologies (Singapore); and Bruce Coulter, Siemens Water Technologies
1:15 PM— Ultrapure Water Sampling Valves: Minimizing Contamination For State-of-the-Art Sample Analysis
Sarah Schoen, Ph.D., and Betty Pennington, Balazs NanoAnalysis
1:45 PM—Nano101: A Synopsis of Select Research Projects at Purdue University’s Birck Nanotechnology Center
Timothy J Miller, Purdue University – Birck Nanotechnology Center
2:15 PM— A New Device for the Rapid Collection and Subsequent Elemental Identification of Sub-50-nm Particles in Ultrapure Water
David Blackford, Ph.D., Fluid Measurement Technologies; Art Ackermann and Gen Wildermuth, Microfier
2:45 PM— Managing Semiconductor Manufacturing Risk through Improved Control of Nano-particles in Ultrapure Water
Slava Libman, Ph.D., M+W Zander U.S. Operations; Andreas Neuber, Ph.D., Applied Materials; Bob Latimer, Hach Co.; Sarah Schoen, Ph.D., Balazs NanoAnalysis; Drew Sinha, Ph.D., SUMCO USA; and David Blackford, Ph.D., Fluid Measurement Technologies Inc.



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