This conference proceedings CD contains the PowerPoint presentations, and Papers when available. Titles of the presentations are listed below. The files are in Adobe Acrobat format for easy viewing.
ULTRAPURE WATER® Asia 2012
July 4-5, 2012 Marina Bay Sands
Co-located at the SIWW
Wednesday, July 4, 2012
9:15 AM--2012 and Beyond: Asian Water Business Opportunities in UPW in Power, Pharmaceuticals, and Microelectronics
Mehbub Khan, Veolia Water Solutions & Technologies
9:45 AM-10:15 AM—Tea Break/Networking
10:15 AM--Sustainable Water Supply - Water, Energy and Waste Nexus
Harry Seah, Singapore PUB
10:45 AM--Asian Water Market and Technology Development Trends
Christina Fang, Dow Water & Process Solutions (South Korea)
11:15 AM--Overview of World Water Markets
Mike Henley, ULTRAPURE WATER
11:45 AM-1: 15 PM—Lunch
1:15 PM—Desalination Market and Technology Trends and Opportunities
Nikolay Voutchkov, Water Globe Consulting
1:45 PM--An Introduction to the ITRS and SEMI Guidelines as they Relate to Semiconductor-Grade Water Requirements
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
2:15 PM--Closed Circuit Desalination for Water Reuse and Low Salinity Water Treatment
Richard Stover, Desalitech, Ltd.
2:45 PM--The Development of a New Non-Light Scattering Particle
Counter and its Potential Use for Risk Mitigation to meet ITRS and SEMI Guidelines for Semiconductor UPW
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
3:15 PM--Tea Break/Networking
3:45 PM--Challenges of Recycling Cooling Tower Blowdown to a Power Plant
Joseph Lander and Michael Chan, Duraflow
4:15 PM--Inlet Distribution Design for an Improved and Robust Condensate Polisher System
Davis Yohanes Arifin and Govindan Alagappan, Siemens Water Technologies
4:45 PM--Day 1 Concludes
Thursday, July 5
9:00 AM--Introductory Remarks by Mr. Dixit
9:15 AM--Progress in RO Membranes and O&M to Mitigate Fouling
Yasushi Maeda, Dow Water & Process Solutions
9:45 AM--Expanding Operational Envelopes of the Electrodeionization
Technology
Vladimir Pavlovic and John Barber, GE Water & Process Technologies
10:15 AM--Tea Break/Networking
10:45 AM--Innovations for Direct UV-Oxidation in Semiconductor Applications
Lukas Staub, Roger Schmid, and Morris Teo, SWAN Analytische Instruments AG
11:15 AM--Performance Qualified UV System Using in PW Treatment and
Distribution
Ying Xu, Andrew Clark, and John Ryan, Hanovia Ltd.
11:45-1:15 PM—Lunch Break
1:15 PM--Ion-Exchange Resin Technology for High-Purity Water Production
Katsuya Takuwa, Dow Chemical Japan Ltd.
1:45 PM--25 Nanometer Optical Particle Counting Technology for High Purity Water Applications
William L. Shade, Jr., Lighthouse Worldwide Solutions
2:15 PM--Saving Energy and Chemicals via Upgrading RO Elements in an
Ultrapure Water System
Andy W.C. Chow, Joseph S.M. Wang, and Chun-ju Chen, Taiwan Semiconductor
Manufacturing Co. Ltd.; and Ronald Wen-Jung Chang, Dow Chemical Taiwan Ltd.
2:45 PM--Tea Break and Networking Session
3:00 PM--Low-Pressure, Dual-Function Membrane Pretreatment To Enhance High Brackish Water Desalination System Performance
Ivy Chua, Richard Woodling, Ph.D., and Gao Yonggang, Siemens Pte. Ltd.
3:30 PM--Electricity Generation from Acidific and Alkaline Waste Effluent
Rongaiang Fu and Keehoe Ng, Siemens Pte. Ltd.
