ULTRAPURE WATER Micro-2011 Proceedings

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This conference proceedings CD contains the PowerPoint presentations, and Papers when available. Titles of the presentations are listed below. The files are in Adobe Acrobat format for easy viewing.

Red Lion Inn
Portland OR, November 2-3, 2011

Wednesday, November 2

Morning Session: UPW Roadmap, Microelectronics Industry Needs/Risks
9:00 AM—Session Introduction
9:15 AM—ITRS Update

Slava Libman, Ph.D., Air Liquide Balazs
9:45 AM—SEMI Filter Performance Validation Task Force Report
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
10:45 AM—Organic Contamination in UPW
Dan Wilcox, Spansion Inc.
11:15 AM—Analytical Methods and Data of Organics Speciation in Ultrapure Water
Hugh Gotts and Slava Libman, Ph.D., Air Liquide Balazs, Stefan Huber, DOC-Labor
Afternoon Session: Technology Development/Optimization
1:15 PM—Effect of Polish Ion Exchange Resin Selection to UPW System Performance

Alan Knapp, Siemens; and Slava Libman, Ph.D., Air Liquide Balazs
1:45 PM—Reverse Osmosis Design Best Practices for UPW Make-Up
Jane Kucera, Nalco
2:15 PM—Trace Urea Removal Technology for Ultrapure Water Quality Improvement
Nobukazu Arai, Shigeki Fujishima, Taro Iizumi, and Ikunori Yokoi, Kurita Water Industries Ltd.
3:15 PM—Minimizing Particle and Metal Ion Contamination for Discrete Components
Edward Cellucci and Greg Michalchuk, Plast-O-Matic Valves Inc.
3:45 PM—Suspension-Polymerized PVDF: Effects of Steam and Ozone Sterilization on Pipes and Fittings Joined by Infrared and Electrofusion Welding
Trevor Spence, Solvay Solexis
4:15 PM--ITRS Discussion

Thursday, November 3
Morning Session: Metrology, Analytical Methods
8:45 AM--UPW Water Business Opportunities in Microelectronics/Photovoltaics

David McBain, Veolia Water Solutions & Technologies
9:15 AM—Digital Sensor Technology Advances Resistivity Measurement Accuracy
David Gray, Anthony Bevilacqua, Ph.D., and James Cannon, Mettler-Toledo Thornton
9:45 AM—The Effect of Particle Composition on Filter Removal of Sub-30-nm particles from UPW
Don Grant, CT Associates
10:30 AM—Monitoring and Controlling UPW Organic Nitrogen Contamination to Improve Immersion Photolithography Process Control
Richard Godec, GE Instruments
11:00 AM—New Developments in Measuring TOC in Semiconductor Applications Roger Schmid, SWAN Analytical
11:30 AM—New Automation and Monitoring Technology to Improve Operation of Membrane Installations
Danny Blagojevich, Barry Carroll, Anders Hallsby, and Brian Jenkins, Nalco Co.

Afternoon Session: Water Management (Conservation)
1:00 PM—Preventing the Release of Nano Materials from Depleting Ion Exchange Beds by Using an On-line Boron Analyzer

Richard Godec, GE Instruments
1:30 PM—Benefits of Regular UPW Operational Data and Trend Review
Brad Herbert, ON Semiconductor; John Morgan, H2Morgan
2:00 PM—Strategic Development and Implementation of Sustainable Water Management Programs for High Volume Manufacturing Using Ultrapure Water
Ralph Williams, James Lozier, and Kyle Poole, CH2M Hill
2:30 PM—Black and Gold and Green: A Progress Report on UPW Recovery at Purdue University’s Birck Nanotechnology Center
Tim Miller, Purdue University
3:00 PM—Economics Benefits of Processing RO Reject with Additional RO for Additional Water Recovery
Brad Herbert, ON Semiconductor; Alan Knapp, Siemens; John Morgan, H2Morgan; Wayne Bates, Hydranautics
3:30 PM­-Detecting 25-nm Particles in DI Water
Bill Shade, Lighthouse Worldwide Solutions

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