ULTRAPURE WATER Asia-2012 Proceedings

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This conference proceedings CD contains the PowerPoint presentations, and Papers when available. Titles of the presentations are listed below. The files are in Adobe Acrobat format for easy viewing.

July 4-5, 2012 Marina Bay Sands
Co-located at the SIWW

Wednesday, July 4, 2012
9:15 AM--2012 and Beyond: Asian Water Business Opportunities in UPW in Power, Pharmaceuticals, and Microelectronics

Mehbub Khan, Veolia Water Solutions & Technologies
9:45 AM-10:15 AM—Tea Break/Networking
10:15 AM--Sustainable Water Supply - Water, Energy and Waste Nexus
Harry Seah, Singapore PUB
10:45 AM--Asian Water Market and Technology Development Trends
Christina Fang, Dow Water & Process Solutions (South Korea)
11:15 AM--Overview of World Water Markets
11:45 AM-1: 15 PM—Lunch
1:15 PM—Desalination Market and Technology Trends and Opportunities

Nikolay Voutchkov, Water Globe Consulting
1:45 PM--An Introduction to the ITRS and SEMI Guidelines as they Relate to Semiconductor-Grade Water Requirements
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
2:15 PM--Closed Circuit Desalination for Water Reuse and Low Salinity Water Treatment
Richard Stover, Desalitech, Ltd.
2:45 PM--The Development of a New Non-Light Scattering Particle Counter and its Potential Use for Risk Mitigation to meet ITRS and SEMI Guidelines for Semiconductor UPW
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
3:15 PM--Tea Break/Networking
3:45 PM--Challenges of Recycling Cooling Tower Blowdown to a Power Plant
Joseph Lander and Michael Chan, Duraflow
4:15 PM--Inlet Distribution Design for an Improved and Robust Condensate Polisher System  
Davis Yohanes Arifin and Govindan Alagappan, Siemens Water Technologies
4:45 PM--Day 1 Concludes

Thursday, July 5
9:00 AM--Introductory Remarks
by Mr. Dixit
9:15 AM--Progress in RO Membranes and O&M to Mitigate Fouling
Yasushi Maeda, Dow Water & Process Solutions
9:45 AM--Expanding Operational Envelopes of the Electrodeionization Technology
Vladimir Pavlovic and John Barber, GE Water & Process Technologies
10:15 AM--Tea Break/Networking
10:45 AM--Innovations for Direct UV-Oxidation in Semiconductor Applications

Lukas Staub, Roger Schmid, and Morris Teo, SWAN Analytische Instruments AG
11:15 AM--Performance Qualified UV System Using in PW Treatment and Distribution
Ying Xu, Andrew Clark, and John Ryan, Hanovia Ltd.
11:45-1:15 PM—Lunch Break
1:15 PM--Ion-Exchange Resin Technology for High-Purity Water Production

Katsuya Takuwa, Dow Chemical Japan Ltd.
1:45 PM--25 Nanometer Optical Particle Counting Technology for High Purity Water Applications
William L. Shade, Jr., Lighthouse Worldwide Solutions
2:15 PM--Saving Energy and Chemicals via Upgrading RO Elements in an Ultrapure Water System
Andy W.C. Chow, Joseph S.M. Wang, and Chun-ju Chen, Taiwan Semiconductor Manufacturing Co. Ltd.; and Ronald Wen-Jung Chang, Dow Chemical Taiwan Ltd.
2:45 PM--Tea Break and Networking Session
3:00 PM--Low-Pressure, Dual-Function Membrane Pretreatment To Enhance High Brackish Water Desalination System Performance

Ivy Chua, Richard Woodling, Ph.D., and Gao Yonggang, Siemens Pte. Ltd.
3:30 PM--Electricity Generation from Acidific and Alkaline Waste Effluent
Rongaiang Fu and Keehoe Ng, Siemens Pte. Ltd.

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